A critical review of ohmic and rectifying contacts for silicon carbide

Abstract

For more than three decades, SiC has been investigated as a wide band gap semiconductor. This paper reviews ohmic and rectifying metal contacts on n- and p-type α- and β-SiC reported throughout that time period. Electrical characteristics, Schottky barrier heights (SBHs), thermal stability, and chemical reactions are discussed. Most metals formed very good rectifying contacts in the as-deposited condition on both n- and p-type 6H-SiC with Schottky barrier heights ⪖ 1 eV. Low ideality factors ( n < 1.1) and high breakdown voltages (> 1100 V) have been displayed in this material. The electrical properties of contacts on 3C-SiC have been more dependent on the quality of the 3C-SiC films, which have been plagued by higher defect densities than 6H-SiC. In general, a partial pinning of the Fermi level has been evidenced by positive correlations, which are less than 1 (≈ 0.2–0.6), between the SBHs and the metal work functions. Ohmic contacts with low contact resistivities (⪕ 10 −5 Ω cm 2), especially important for high power applications, on any of the SiC polytypes have been exceptionally difficult to achieve. Most of the ohmic contacts have relied on high doping concentrations in combination with annealing at temperatures between 800 and 1300 °C. Annealed Ni and Al have primarily been used in ohmic contact metallizations for n- and p-type SiC, respectively. The tendency of SiC to react with metals to form carbides and/or silicides at potential device operating temperatures ( ∼ 600 °C) can be a problem for potential long term applications at high temperature. These critical issues are discussed along with future perspectives for research approaches.