Abstract
A coupled adaptive PI tuning method for rapid thermal chemical vapor deposition systems (RTCVD) is proposed in this paper. RTCVD, as one of rapid thermal processing (RTP) craft, is the main method to produce polycrystalline silicon thin films. The temperature in the furnace is crucial to the quality of polycrystalline silicon thin films, which has great influence on semiconductor industries. To improve the quality of the films, a coupled adaptive PI tuning method based on simultaneous perturbation stochastic approximation (SPSA) algorithm is applied to the RTCVD systems. Simulation results show that satisfactory performances can be obtained using the proposed tuning method.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
