Abstract

The present paper deals with the reflection process of a shock wave on a shock-tube endwall in a vapour and with the growth process of liquid films formed both on the end-and sidewalls. Two-dimensional thin-layer Navier-Stokes equations for the vapour and two-dimensional heat conduction equations both for the liquid films and the shock-tube walls are solved under molecular gas dynamical boundary conditions by finite difference methods. It is shown that flow fields in the shock wave reflection region are very complicated because of the interaction of the reflected shock wave with a boundary layer on the sidewall. But there is no large difference between the present results of film growth and that of the one-dimensional model. The results are compared with experimental ones.

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