Abstract
This paper deals with Langmuir probe measurements in a planar magnetron sputtering system in which the plasma confinement near a target can be improved by means of an assembly of permanent magnets placed above the target. The electron density, electron temperature, plasma and floating potentials and electron distribution function are measured in various positions between the target and a substrate under various conditions in the discharge. Our experiments proved that the additional magnetic confinement leads to approximately two times higher electron density and strong enhancement (by about an order of magnitude) of the electron temperature in almost all positions of the deposition system investigated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
