A Comparison of Current and Emerging Ion and Laser Beam Techniques for High Throughput Material Removal

Abstract

Journal Article A Comparison of Current and Emerging Ion and Laser Beam Techniques for High Throughput Material Removal Get access Srinivas Subramaniam, Srinivas Subramaniam Intel Corporation, Chandler, AZ, U.S.A. Search for other works by this author on: Oxford Academic Google Scholar Kaushik Muthur, Kaushik Muthur Intel Corporation, Chandler, AZ, U.S.A. Search for other works by this author on: Oxford Academic Google Scholar K Johnson, K Johnson Intel Corporation, Chandler, AZ, U.S.A. Search for other works by this author on: Oxford Academic Google Scholar Mclean P Echlin Mclean P Echlin Materials Department, University of California at Santa Barbara, Santa Barbara, CA, U.S.A. Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 23, Issue S1, 1 July 2017, Pages 270–271, https://doi.org/10.1017/S1431927617002033 Published: 04 August 2017