Abstract
Thin Cr films were deposited on single crystal α-Al2O3, SrTiO3 and TiO2 (rutile) substrates under ultrahigh vacuum conditions using molecular beam epitaxy (MBE). The growth behavior and thermal stability of the films were investigated with scanning tunneling microscopy (STM), X-ray phototelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and transmission electron microscopy (TEM). Cr grew as 3D clusters on all substrates. For all three Cr/oxide systems a strong temperature dependent interfacial reaction was observed. The results suggested that these reactions depended greatly on thermodynamics and on transport properties in the oxide substrates.
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