Abstract

In this study, nanocrystalline SiC films were successfully synthesized on the surface of multimode fiber (MMF) sensors using 150MHz very-high-frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) and dielectric barrier discharge nonthermal plasma (DBD-NTP) methods. The effects of the different utilized methods and various deposition times on the microstructure and chemical composition of the deposited SiC films were investigated For both methods, the SiC film thickness increased with increased deposition time. The dependency of sensitivity on the deposition time and thickness of SiC films was studied by investigating the effects of refractive index and temperature variation on the response of the MMF sensors. The SiC films deposited by 150MHz VHF-PECVD showed more uniformity and higher sensitivity compared to those deposited using DBD-NTP. Using VHF-PECVD with a deposition time of 1min yielded the lowest thickness (54.06nm) and therefore the highest sensitivity (0.0240dB/°C) for the SiC-deposited MMF sensors. Thus, the VHF-PECVD method may be a better option than DBD-NTP for the deposition of thin SiC films to improve the sensitivity of the MMF sensors.

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