A compact electron beam ion source for highly charged ion experiments at large-scale user facilities

Abstract

Probing and manipulating of 2D materials and their heterostructures using slow highly charged ions (HCIs) is currently a hot topic due to the ultimate surface sensitivity of electronic sputtering with profound implications for fundamental research and technological applications. To study surface modifications without the complications of sample transport from ion irradiation to complex microscopic or spectroscopic analysis tools, the development of compact and thus portable ion sources is essential. In this paper we present the first results of the electron beam ion source-Compact version 1 (EBIS-C1), a novel and highly compact source for highly charged ions manufactured by D.I.S Germany GmbH. The main focus of this paper is to demonstrate the suitability of the EBIS-C1 as an ideal source for ion scattering experiments at surfaces and at gas/liquid jet targets by presenting the first charge state spectra of extracted neon, argon and xenon ions. The results highlight the potential of this portable EBIS to become a versatile platform for the study of HCI-surface interactions, allowing investigations to be carried out at user terminals in different laboratory environments.