A broadband antireflective nanostructure with Ag nanoparticles on SiO2 nanocolumns

Abstract

A broadband antireflective nanostructure with Ag nanoparticles on SiO2 nanocolumns has been presented. Ag nanoparticles are located at the top of SiO2 nanocolumns which are deposited on Si substrates. SiO2 nanocolumns are fabricated by oblique angle deposition through electron beam evaporation, and Ag nanoparticles are fabricated by thermal evaporation. Experimental results show that the average reflection can reach 3.84% in the range of 400–700 nm and 5.75% in the range of 400–1100 nm, much lower than that of Ag islands on SiO2 thin films. The simulation shows that the broadband low reflection can be attributed to the localized surface plasmon resonance of Ag nanoparticles whose resonance wavelengths depends on the size of Ag nanoparticles. The different diameters of SiO2 nanocolumns determine the size distribution of Ag nanoparticles which resonate in a wide wavelength range and lead to a broadband low reflection. This provides a possible way to fabricate a broadband antireflection structure.