Abstract
A 7F/sup 2/ DRAM trench cell and corresponding vertically folded bitline (BL) architecture has been fabricated using a 0.175 /spl mu/m technology. This concept features an advanced 30/spl deg/ tilted array device layout and an area penalty-free inter-BL twist. The presented scheme minimizes local well noise by maximizing the number of twisting intervals. A significant improvement of signal margin was measured on a 32-Mbyte test chip.
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