A 45 nm 10T Dual-Port SRAM with Shared Bit-Line Scheme for Low Power Operation

Abstract

This paper proposes a 10T bit-cell of dual-port (DP) SRAM design to improve Static Noise Margin (SNM) and solve write/read disturb issues in nano-scale CMOS technologies. In additional used the row access transistor in the bit-cell, adding Y -access MOS (column-direction access transistor) can improve dummy-read cells’ noise margin and isolate the pre-charge noise from bit-lines in synchronous or asynchronous clock operation. The paper also proposes a scheme of combining the row access transistor and sharing bit-line with an adjacent bit-cell. This scheme can reduce the bit-line number to half and mitigate the current consumption of the write/read buffer caused by precharging the bit-line to VDD. Furthermore, Y -passgate (column direction access transistor) numbers can also be reduced to half with the proposed DP 10T SRAM architecture. The result shows that write/read buffer current consumption was reduced by over 30%, compared to the conventional DP 8T structure from 1.4 V to 0.6 V VDD.