Abstract
This model finds the plasma density distribution, n(x,y), and the positive electrical potential, {phi}{sub {infinity}}, between the surface of a planar magnetron cathode and a distant, uniform plasma. The intended application is for parameter studies of gas discharges in the range of 1--100 mTorr, which are often used as sputtering sources. The primary results are formulas which show how the spatial variation of the magnetic field, B(x,y), shapes the plasma density and influences the potential, as well as determining the magnitude of the magnetron current parallel to the cathode surface.
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