Abstract
This model finds the plasma density distribution, n(x,y), and the positive electrical potential, {phi}{sub {infinity}}, between the surface of a planar magnetron cathode and a distant, uniform plasma. The intended application is for parameter studies of gas discharges in the range of 1--100 mTorr, which are often used as sputtering sources. The primary results are formulas which show how the spatial variation of the magnetic field, B(x,y), shapes the plasma density and influences the potential, as well as determining the magnitude of the magnetron current parallel to the cathode surface.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
