Abstract

A 0.6–1.1 V, 84 Mb pipelined SRAM array design implemented in 14 nm FinFET CMOS technology is presented. Two array architectures featuring a high-density 0.0500 µm 2 6T SRAM bitcell and a 0.0588 µm 2 6T SRAM bitcell targeting low voltage operation are detailed. The high-density array design reaches 2.7 GHz at 1.1 V with 14.5 Mb/mm 2 bit density, while the low voltage optimized array can operate at 0.6 V, 1.5 GHz under typical process conditions. A capacitive charge-share transient voltage collapse write-assist circuit (CS-TVC) enables a 24% reduction in write energy compared to previous techniques by eliminating bias currents during operation. Technology and assist co-optimization enable $>$ 50 mV reduction in V $_{\rm MIN}$ and a 1.81× increase in density over a 22 nm design.

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