Abstract
In an alternative current plasma display panel (ac-PDP), the transparent magnesium oxide (MgO) protective layer plays very important roles. Improvement of the secondary electron emission coefficient of the protective layer is essential for decreasing the consumption energy of PDP. In this study, nickel oxide (NiO) was added to the MgO thin film material. The change of the secondary electron emission coefficient of the thin films prepared using the compound MgO materials was investigated. The compositions and crystalline structure of the thin films were obtained using Rutherford backscattering spectroscopy (RBS) and X-ray diffraction (XRD) method, respectively. X-ray photoelectron spectroscopy (XPS) was adopted to investigate their surface conditions. The correlation between the secondary electron emission coefficient and other properties, such as composition, crystalline structure, and surface chemical condition, was investigated. The experimental results show that the change of the concentration of the added-NiO causes the change in the surface chemical condition and the crystalline structure. Moreover, the secondary electron emission coefficient was clearly changed with the concentration of added-NiO.
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