Abstract
AbstractFive novel 9,10‐dithio/oxo‐anthracenes (ANs) are synthesized, which can be used as efficient photosensitizers for a biimidazole (BCIM) photoinitiator system in dry film photoresists. The potential of ANs as photosensitizer for BCIM is investigated in detail through fluorescence spectra, ESR, and real‐time FT‐IR. The resulting ANs possess strong absorption in the near UV–vis range from 350 to 450 nm with high molar extinction coefficients. The thiol ether and phenyl groups can make UV–vis absorption to be enhanced and red‐shifted significantly. Upon irradiation with 365 or 450 nm of light, BCIM can be photosensitized by ANs and can initiate photopolymerization of acrylate monomer (HDDA) efficiently. The dry film photoresist containing AN@BCIM photoinitiator system can form fine micro‐patterns with high resolution through 405 nm laser direct‐writing photolithography.
Published Version
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