Abstract
This article examines the feasibility of fabricating polycrystalline ZnS and ZnS:Mn films with a size of 9 in. diagonal (190 mm × 130 mm) for use in thin film electroluminescent display via low pressure metallorganic chemical vapor deposition. The uniformities of film thickness and crystallinity are studied as functions of flow rate, the slit width of inlet nozzles, and the manganese concentration. Uniform polycrystalline ZnS and ZnS:Mn films are also obtained. Film thickness variance is controlled below ±3%. Less than ±5% variation in x‐ray full width at half maximum is obtained in the ZnS film as well. The atomic ratio of S/Zn is close to unity value, as estimated by the measurement of electron probe microanalyzer. In addition, the distribution of manganese dopant concentration in ZnS:Mn films is also uniform. The uniform counts of Zn, S, and Mn atoms persist throughout the ZnS:Mn films, as demonstrated by the secondary ion mass spectrometry. Moreover, atomic force microscopy image root‐mean‐square roughness of film's surface is measured to be 93 Å.
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