Abstract

We demonstrate high‐performance, coplanar polycrystalline InGaO (poly‐IGO) thin film transistors (TFTs) on polyimide (PI) substrate. The TFTs exhibit the saturation mobility (µSAT) of >45 cm2 V-1 s-1 and very stable bias stress stabilities of negligible ΔVTH of +0.2 V and +0.1 V under PBTS and NBTS, respectively. A gate driver on the PI substrate is working well with a very low rising and falling time of less than 0.62 µs. Therefore, the flexible poly‐IGO TFTs could be used for high‐resolution foldable AMOLED display backplanes.

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