Abstract
The MEMS technology for various nano/micro devices often requires special facilities and complicated and multistage processes, thus the fabrication cost is extremely high. This research aimed to fabricate nanoscale structures on monocrystalline silicon substrates using nanoscratching. In this paper, nano/micro-scale line-and-space patterns were generated on a silicon substrate using an atomic force microscope equipped with a sharp probe made of monocrystalline diamond. Subsequent chemical etching was also conducted on the fabricated line-and-space patterns. As a result, it was confirmed that the groove was deepened several times but little increased in its width.
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