Abstract
This paper reports on a metal mask‐less lithography (MML) process for RGB OLED displays. By integrating MML, tandem OLEDs, and a microlens array (MLA), ultra‐high resolution, high luminance, and robust reliability can be realized. The report also demonstrates an MLA using an S‐stripe MLA pattern. The prototype exhibits excellent properties, with a white light efficiency of 66.7 cd/A at 15,000 cd/m².
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