Abstract

Optically pumped lasing from AlGaN/AlN multiple quantum wells grown on single-crystalline AlN substrates with lasing thresholds as low as 6 kW/cm2 is demonstrated via the reduction of unintentional point defects in the active region and waveguide, which reduces the non-radiative recombination by 2 orders of magnitude. A higher lasing threshold of 11 kW/cm2 is observed for AlGaN barriers, owing to the reduced localization of electrons and holes in the wells. It is shown that for electrically injected UVC laser diodes, AlGaN barriers are essential.

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