Abstract

Most optical, electrical, mechanical, or biological active thin films are deposited using the well-known and established vacuum-based physical vapor deposition and chemical vapor deposition methods. The deposition of thin functional layers under atmospheric pressure conditions is an attractive alternative for especially large-area coatings. In recent years many different methods have been established for various applications. Particularly the flame-based techniques offer a cost-effective solution. The basic principles of the flame-based deposition techniques are reviewed and the technical realization is shown by means of selected examples of the current research and developments. The formation of silicone oxide layers with a wide range of properties is investigated in detail. Applications such as adhesion promotion, optical effective, and barrier layers are reviewed. The deposition of transparent conductive zinc oxide is investigated. Further thin films like photocatalytic active TiO2, electrochromic WOx, and elemental silver are also introduced.

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