Abstract
The adhesion force (pull-off force) was measured on silicon surface by using a cantilever having a flat probe. The silicon surface was first modified by focused ion beam (FIB) and patterns composed of plateaus and grooves were obtained. The distance between grooves were changed to obtain different size of plateau. The tip of cantilever probe was cut off to get flat part of approximately 1μm^2 by using FIB. The silicon plate with plateau and groove patterns and the flat cantilever were then set in an atomic force microscope (AFM) and the pull-off forces between the flat cantilever and the patterns at various contact time in high vacuum conditions. The results showed that the pull-off force increased with longer contacting time, but was not affected by the plateau size.
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