Abstract
AbstractRecently, oxide semiconductors have been coming under the spotlights as a replacement of the amorphous silicon (a‐Si) and it is going to be taken into mass production of Active Matrix‐Liquid Crystal Displays (AM‐LCD). However, innovation or further optimization has still been required in film deposition techniques and also in the arrangement of sputtering targets for high definition Active Matrix‐Organic Light Emitting Diodes (AM‐OLED). In this report, ULVAC addresses our analysis and approaches for those issues.
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