Abstract
We demonstrate that GaAs grown by molecular beam epitaxy on silicon has ideal characteristics for THz receiver applications. The lattice mismatch between silicon and GaAs causes a disordered growth of GaAs, reducing the carrier lifetime to 1.8 ps. This is similar to the characteristics observed in low temperature grown GaAs. Furthermore, the high resistivity silicon substrate has a very low absorption and dispersion in the far infrared. This makes it an ideal material in THz system applications, and we show that a maximum frequency of 5 THz and a sixfold increase in sensitivity can be obtained using a GaAs-on-silicon based THz detector.
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