Abstract
High-power plasma power supply is very useful for many industrial and medical applications. Plasma is generated artificially in the laboratory or industry by applying the electric or magnetic field. In this manuscript, we presented the simple 4T analog MOS control high voltage high frequency inverter circuit as a plasma power supply using modulation index technique. The presented plasma power supply operated at 25 kHz frequency and 10 kV peak to peak voltage. It generates a 0 V to 10 kV controllable electric field. The generated electric field is applied and produces plasma, which can be used for many industrial applications. A 10 kV to 5 kW plasma power supply has been practically developed based on the proposed topology and experimentally tested and, additionally, excellent output power conversion efficiency is achieved. From these results, the 4T analog MOS control high voltage high frequency (HVHF) plasma switching power supply is verified.
Highlights
Plasma is an ionized gas, into which sufficient energy is provided to free electrons from atoms or molecules
We presented the plasma power supply with 10 kVp-p, which is applied to the plasma load for water purification
The high voltage high frequency (HVHF) plasma switching power supply design and workings are discussed below based on the experimental results
Summary
Plasma is an ionized gas, into which sufficient energy is provided to free electrons from atoms or molecules. Plasma is an electrically inoffensive medium of unbound positive and negative particles. They are not ‘free’ in the sense of not experiencing forces. Moving charged particles generate an electric current within a magnetic field, and any movement of a charged plasma particle affects and is affected by the fields created by the other charges. This governs collective behavior with many degrees of variation [2,3]
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