Abstract

In recent years, X-ray has been attracting enormous attention as a tool to determine the magnetic properties of thin film material. We have constructed a simple method base on 4F imaging system to determine analytically optical properties of thin film material. Very small narrow slit is applied to yield diffraction and interference pattern in the X-ray scale. It was found that the sequential changes of Fraunhofer diffraction pattern due to slit width variation. Sensitivity of the method was validated by measuring the power distribution of the temporal observed patterns. The object shape was also varied for comprehensive discussion.

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