Abstract

We report a flexible AMOLED display driven by oxide thin film transistors (TFTs) based on a polyimide (PI) substrate. In the oxide TFT, a triple-stacked structure of active layer is employed to improve the mobility and stability. The fabricated TFT exhibit a high field-effect mobility of 38.8 cm2 V−1 s−1, a subthreshold swing of 0.15 V/dec, and an Ion/Ioff ratio of 109. Meanwhile, Al2O3 film prepared by the method of atomic layer deposition (ALD) is used as the encapsulation of AMOLED display, which demonstrating a superior water vapor transmission rate (WVTR) as low as 5.43×10−5 g/m2/day estimated by Calcium (Ca) corrosion method at 40 °C/100%.

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