Abstract
We have investigated the co-sputtering of two dielectric materials with indices of refraction as widely different as possible with the aim of obtaining both homogeneous films with any intermediate index of refraction and inhomogeneous films with predetermined profiles. An rf sputtering module will be described which has been especially designed, with two separate cathodes and two independently tunable rf generators. The substrates are placed on a circular anode rotating underneath the two cathodes. So far mainly CeO 2, TiO 2 and SiO 2 targets have been used. The deposition rate from each cathode and the total film thickness are determined by means of two quartz thickness monitors, sputtering compatible. Values obtained for the refractive index and optical thickness will be reported, as well as repeatability, mechanical and chemical characteristics, reliability and high power optical radiation resistance. Finally, results obtained on optical components of practical interest will be discussed.
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