Abstract

These proceedings present the written contributions of the participants of the 3rd International Meeting for Researchers in Materials and Plasma Technology (3rd IMRMPT) and the 1st Symposium on Nanoscience and Nanotechnology which was held from 4 to May 9, 2015 at the Dann Carlton Hotel Bucaramanga, Colombia, organized by the faculty of science of the Universidad Industrial de Santander (UIS) and the basic science department of the Universidad Pontificia Bolivariana. This was the third version of biennial meetings that began in 2011.The five-day scientific program of the 3rd IMRMPT consisted of 24 Magisterial Conferences, 70 Oral Presentations, 185 Poster Presentations, 3 Courses and 1 Discussion Panel with the participation of undergraduate and graduate students, professors, researchers and entrepreneurs from Colombia, Russia, Germany, France, Spain, England, United States, Mexico, Argentina, Uruguay, Brazil, Venezuela, among others. Moreover, the objective of IMRMPT was to bring together national and international researchers in order to establish a network of scientific cooperation with a global impact in the area of the science and the technology of materials; to promote the exchange of creative ideas and the effective transfer of scientific knowledge, from fundamental research to innovation applied to industrial solutions and to advances in the development of new research allowing to increase the lifetime of the materials used in the industry by means of efficient transference of the knowledge between sectors academia and industry.The topics covered in the 3rd IMRMPT include New Materials, Surface Physics, Structural Integrity, Renewable Energy, Online Process Control, Non Destructive Evaluation, Characterization of Materials, Laser and Hybrid Processes, Thin Films and Nanomaterials, Surface Hardening Processes, Wear and Corrosion/Oxidation, Plasma Applications and Technologies, Modelling, Simulation and Diagnostics, Biomedical Coatings, Surface Treatments and Surface Modification (Ion Implantation, Ion Nitriding, PVD, CVD). The editor hopes that those interested in the area of the science and the technology of materials and plasma enjoy the reading that reflect a wide range of topics.It is a pleasure to thank the sponsors, partners and all the participants and contributors for making possible this international meeting of researchers.It should be noted that the event organized by UIS, through of the research groups FITEK and CMN, was a very significant contribution to the national and international scientific community, achieving the interaction of different research groups from academia and business sector.On behalf of the research groups FITEK and CMN of the UIS, we greatly appreciate the support provided by the Sponsors and Partners, who allowed to continue with the dream of research which contributing to Innovation and development in the present and future of Colombia.The EditorEly Dannier V. Niño

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