3D photolithography through light field projections.

Abstract

A methodology of 3D photolithography through light field projections with a microlens array (MLA) is proposed and demonstrated. With the MLA, light from a spatial light modulator (SLM) can be delivered to arbitrary positions, i.e., voxels, in a 3D space with a focusing scheme we developed. A mapping function between the voxel locations and the SLM pixel locations can be one-to-one determined by ray tracing. Based on a correct mapping function, computer-designed 3D virtual objects can be reconstructed in a 3D space through a SLM and a MLA. The projected 3D virtual object can then be optically compressed and delivered to a photoresist layer for 3D photolithography. With appropriate near-UV light, 3D microstructures can be constructed at different depths inside the photoresist layer. This 3D photolithography method can be useful in high-speed 3D patterning at arbitrary positions. We expect high-precision 3D patterning can also be achieved when a femtosecond light source and the associated multi-photon curing process is adopted in the proposed light field 3D projection/photolithography scheme. Multi-photon polymerization can prevent the unwilling patterning of regions along the optical path before arriving to the designed focal voxels as observed in our single photon demonstrations.