Abstract

This paper demonstrates a 3D microlithography system where an array of 5 mm Ultra Violet-Light Emitting Diode (UV-LED) acts as a light source. The unit of the light source is a UV-LED, which comes with a length of about 8.9 mm and a diameter of 5 mm. The whole light source comprises 20 × 20 matrix of such 5 mm UV-LEDs giving a total number of 400 LEDs which makes it a very favorable source with a large area for having a batch production of the desired microstructures. This light source is able to give a level of precision in microfabrication which cannot be obtained using commercial 3D printers. The whole light source performs continuous rotational movement once it is turned on. This can also move up and down in a vertical direction. This multidirectional light source also comprises a multidirectional sample holder. The light source teaming up with the multidirectional sample holder highly facilitates the process of fabrication of a huge range of 3D structures. This article also describes the different levels of characterization of the system and demonstrates several fabricated 3D microstructures including high aspect ratio vertical micro towers, twisted turbine structures, triangles, inclined pillar ‘V’ structures, and hollow horn structures as well.

Highlights

  • The process of lithography has advanced manifolds with the course of time

  • The current fabrication procedure followed by different research groups is more or less similar in their applications [8] but the difference lies mainly in the light source used for exposure, the substrate holder used for determining the exposure direction, or the material used for making microstructures

  • The Ultra Violet-Light Emitting Diode (UV-LED) light source explained here is capable of operating at a high-intensity level and a variable range of intensities

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Summary

Introduction

The process of lithography has advanced manifolds with the course of time. Researchers have presented their findings and suggestions from time to time that have enriched the process of photolithography. With the recent advancement of UV-LEDs and the availability of various wavelengths, researchers are moving towards an easier and more convenient UV-LED light source exposure system [10,11] It has been demonstrated how a specific wavelength of UV-LED can be a good replacement for traditional UV lamps that contains multiple-wavelength peaks [12] and can achieve success in maskless photolithography as well [13]. The exposure system discussed in this article is comprised of the user controllable light source with higher intensity and an integrated tilt rotational substrate holder, as well as dedicated software to run the programs. The light source discussed in this article is comprised of Micromachines 2020, 11, 157 commercial 5 mm UV-LED and can be illuminated in certain areas and the part of the light source that needs to be illuminated is controlled by computer program

Light Source
Software
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