Abstract
Currently, Through mold via (TMV) technology is being actively researched for 3D-Intergrated Circuit stacking in fan-out wafer level packaging (FOWLP). However, because of problems, such as extrusion, cracking, and warping of the Cu materials forming the via, its mass production process is difficult. Moreover, sudden temperature changes when using the chips cause heat fatigue in the TMV. To overcome this problem, the Epoxy molding compound (EMC) filling via (EFV) is being developed to form a thin Cu via through a deposition process and then fill the interior of the via with EMC. Through simulations, this study analyzed the thermal-mechanical properties of the TMV in the 3D-FOWLP according to the type of TMV (Cu via and EFV) to minimize the thermal stress and deformation generated when using the chip. Consequently, EFV exhibits better thermal-mechanical properties in comparison with those of the Cu via when the 3D-FOWLP is deformed by heat.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
