Abstract
In the presence of a small amount of acid, 3-phenyl-3,3-ethylenedioxy-1-propyl p-toluenesulfonate autocatalytically decomposed to give p-toluenesulfonic acid both in solution and in a polymer matrix. Such a reaction was successfully applied for the improvement of sensitivity of several positive-working chemical-amplification photoresists. It was revealed that the diffusion of the acid plays the most essential role in the sensitivity enhancement, by determining the addition effect of the acid amplifiers with various arenesulfonates on photosensitivity characteristics.
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Schedule a callMore From: Chemistry of materials : a publication of the American Chemical Society
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