Abstract
Weak absorption remains a vital factor that limits the application of two-dimensional (2D) materials due to the atomic thickness of those materials. In this work, a direct chemical vapor deposition (CVD) process was applied to achieve 2D MoS2 encapsulation onto the silicon nanopillar array substrate (NPAS). Single-layer 2D MoS2 monocrystal sheets were obtained, and the percentage of the encapsulated surface of NPAS was up to 80%. The reflection and transmittance of incident light of our 2D MoS2-encapsulated silicon substrate within visible to shortwave infrared were significantly reduced compared with the counterpart planar silicon substrate, leading to effective light trapping in NPAS. The proposed method provides a method of conformal deposition upon NPAS that combines the advantages of both 2D MoS2 and its substrate. Furthermore, the method is feasible and low-cost, providing a promising process for high-performance optoelectronic device development.
Highlights
Two-dimensional (2D) materials, including transition metal dichalcogenides (TMDs) [1,2,3], graphene [4,5], black phosphorus [6,7], etc., are attracting ongoing focus due to unique physical properties compared with their block counterparts, owing to the thickness at the atom diameter level and structure [8]
There is a huge obstacle confusing almost all of those who have tried to develop high-performance detectors based on 267. https://Two-dimensional (2D) materials—namely, the extremely weak absorption of incidence [14]
Researchers are working hard to bring up various methods to promote the light absorption of 2D material-based optoelectronic devices
Summary
Two-dimensional (2D) materials, including transition metal dichalcogenides (TMDs) [1,2,3], graphene [4,5], black phosphorus [6,7], etc., are attracting ongoing focus due to unique physical properties compared with their block counterparts, owing to the thickness at the atom diameter level and structure [8]. Toward scalable ultrathin photodetection devices based on hot-electrons technology [18] These researchers contributed to optical absorption enhancement a great deal, and the noble metal-based surface plasmon was proven to be an effective approach to that issue. Zhang et al proposed a resonant nanostructure with multilayer configuration based on subwavelength gratings of monolayer MoS2 , realizing perfect ultra-narrowband visible absorption [21] These efforts provide alternative ways to enhance the absorption in 2D material-based optoelectronic devices, and impressive results were achieved. Regarding the fabrication, these methods still require a relatively complex process and materials—for example, a microcavity-based graphene detector compared with commercial Si-based detectors. The properties, including the electronic band structure of MoS2 , have been widely studied [24,25,26,27,28], which helps us understand the properties of this material, and here, we mainly focused on the direct deposition of MoS2 on a nanostructured silicon substrate
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