Abstract

The influence of grain boundary (GB) properties on device parameters of polycrystalline silicon (poly-Si) thin film solar cells is investigated by two-dimensional device simulation. A realistic poly-Si thin film model cell composed of antireflection layer, (n + )-type emitter, thick p -type absorber, and (p + )-type back surface field was created. The absorber consists of a low-defect crystalline Si grain with an adjacent highly defective grain boundary layer. The performances of a reference cell without GB, one with n -type and one with p -type GB, respectively, are compared. The doping concentration and defect density at the GB are varied. It is shown that the impact of the grain boundary on the poly-Si cell is twofold: a local potential barrier is created at the GB, and a part of the photogenerated current flows within the GB. Regarding the cell performance, a highly doped n -type GB is less critical in terms of the cell’s short circuit current than a highly doped p -type GB, but more detrimental in terms of the cell’s open circuit voltage and fill factor.

Highlights

  • IntroductionPolycrystalline silicon (poly-Si) is an attractive absorber material for thin film solar cells

  • Polycrystalline silicon is an attractive absorber material for thin film solar cells

  • The influence of grain boundary (GB) properties on device parameters of polycrystalline silicon thin film solar cells is investigated by two-dimensional device simulation

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Summary

Introduction

Polycrystalline silicon (poly-Si) is an attractive absorber material for thin film solar cells. The best poly-Si thin film solar cells today show significantly lower efficiencies of 10.4% [4] and record VOCs of up to 582 mV [5,6,7], depending on the poly-Si material manufacturing method and contacting scheme. This demonstrates that there is a need and a potential of improvement of the poly-Si material. A basic 2D model of the poly-Si thin film solar cell was developed consisting of a low-defect crystalline grain and a highly defective grain boundary layer. While the influence of the GB doping type is ambivalent dependent on the parameter range, the cell’s VOC in general deteriorates in the presence of a GB

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