Abstract
Compounds of the type M x T y D z OH (M = (CH 3) 3Si(O 0.5) 3; D OH = HOSICH 3(O 0.5) 2) were investigated by 29Si NMR spectroscopy in order to deduce the average molecular structure of silicon resins from the dependence of chemical shifts on the structural properties of the oligomeric model compounds. Silicon resins were found to consist of mainly polycyclic connected tetrameric silicone rings containing a certain proportion of D OH and T cy-3 units.
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