Abstract
AbstractMgO films have been successfully deposited by a DC reactive magnetron sputtering process using magnesium metal targets. The MgO films exhibit a preferred (111) orientation, high crystallinity, large grain size, good uniformity and better than 90% optical transmission. These properties are comparable to those produced by electron beam evaporation which is currently the predominant technique for MgO coating. The cathode voltage and the control thereof were found to be critical to the deposition process. This work demonstrates that reactive magnetron sputtering is a viable alternative for depositing high quality, uniform MgO on large substrates for plasma display applications.
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