Abstract
Positive and negative tone chemical amplified resist (CAR),1 pigmented with high brightness and contrast, were composed with poly(4‐hydroxystyrene), or PHOST, a photochemical acid generator,2 and a melamine cross‐linker (only included in negative tone resist). At first, the compatibility between each of the components of resist was confirmed using precipitation method under 45°C, UV‐Vis absorption spectral data, Dynamic Light Scattering (DLS). The absorption properties and particle size analyses were studied in organic solvents of different polarities and the influence of solvent polarity on the wavelengths of the absorption and particle size distribution is described. Two types of chemical amplified resists, positive and negative tones, coated on a Corning EAGLE XG glass substrate followed by exposure to the UV radiation using photomasks with variously designed size patterns, post‐exposure baking (PEB, applied in negative tone resist), development with aqueous bases, were then compared in terms of pattern resolution, pattern cross‐section profiles, chromaticities, reliability tests.
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