Abstract
AbstractCurtain Mura is caused by stress‐induced change in optical parameters of the TFT‐TN panel after COG ACF process. We have used simulation to identify the most sensitive optical parameters among cell gap, pretilt and twist angles that could be changed by induced residual stress to cause Curtain Mura. We have also measured optical‐parameter variations in the Curtain Mura and Normal zones on a TFT‐TN panel. We conclude that Curtain Mura occurs mainly due to the stress‐induced change in twist angle of the TFT‐TN panel. We also point out that TN‐cell gap designed at Gooch‐Tarry first‐ minimum is an effective way to reduce the occurrence of Curtain Mura.
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