Abstract
A fabrication method of patterns having different depths and an optional inclination of side-wall on a micro-flow device is developed using synchrotron radiation with the use of double masking process and the moving masks process. Preparing a micro-flow device with ribs along both sides of the micro-flow path was successfully done and this process is considered to be useful for the patterning technique when an adhesion step with a cover plate must be followed. Utilizing the device has made the adhesion process with a cover plate quite satisfactory, eliminating the need of surface-to-surface adhesion that often involves bubble inclusion between the plates. Also, it is a feature that the height of channel can be controlled within the limit of the ribs in the case of this process.
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