Abstract
We investigated the emission wavelength uniformity of 200-mm GaN-on-Si based blue light-emitting diode (LED) wafer grown by metalorganic vapor phase epitaxy (MOVPE). The larger the Si substrate diameter becomes, the more difficult to obtain uniform distribution of the emission wavelength because of the larger bow during growth, resulting in larger on-wafer inhomogeneity in growth temperature. Owing to the GaN-on-Si buffer strain management, optimized gas flow condition, and precise control of temperature balance in a reactor, we have achieved high thickness and crystal quality uniformity over the 200-mm GaN-on-Si based blue LED wafer. As a result, excellent blue photoluminescence emission wavelength uniformity from the InGaN-multi-quantum wells can be demonstrated on a 200-mm wafer with a standard deviation of 2.53 nm (0.57%). Less wavelengths binning with these highly uniform emission over the 200-mm wafer show the capability of sustainable cost reduction in LED fabrication based on GaN-on-Si technology.
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