20-Gbps 1300-nm range wafer-fused vertical-cavity surface-emitting lasers with InGaAs/InAlGaAs superlattice-based active region

Abstract

1300-nm vertical-cavity surface-emitting lasers (VCSELs) were fabricated by wafer fusion (WF) technique and studied. The active region based on InGaAs/InAlGaAs superlattice was grown by molecular-beam epitaxy (MBE). Current and optical confinement was provided by composite n ++ -InGaAs / p ++ -InGaAs / p ++ -InAlGaAs buried tunnel junction (BTJ) realized by selective etching and overgrowth by n-InP. AlGaAs/GaAs distributed Bragg reflectors grown by MBE were applied on both sides of the cavity by WF and substrate removal techniques. The devices with BTJ diameter of 5 μm demonstrated a stable single-mode lasing with threshold current <1.3 mA and output optical power >6 mW and operation in a wide temperature range. The measured −3 dB bandwidth was more than 8 GHz at 20°C and about 5.5 GHz at 85°C, the eye diagrams were open with a bit rate up to 20 Gbps using nonreturn-to-zero (NRZ) modulation standard at 20°C. Using 5-tap feedforward equalizer, the NRZ transmission at 25 Gbps was demonstrated up to 5 km single-mode fiber at 20°C. The developed VCSELs represent a platform for further significant performance improvement.