Abstract
In this paper the photolithgraphic patterning approaches of quantum dots in electroluminescent devices and demoes were summerized. Photolithograpy process meets the requirements for QLED mass production, including high pixel density, large‐area process and low cost. We summerized three approaches of quantum dot photolithographic procrsses, including direct photolithography, photolithography with lift‐off process and sacrificial layer assisted patterning (SLAP).
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