Abstract
An anomalous oxide band structure was observed parallel to the surface in the internally oxidized layer of nickel alloys with silicon up to 4 wt%. The morphology of the oxide bands was as follows. (1) The distance between oxide bands in the internally oxidized layer increased with decreasing concentration of the solute and with increasing distance from the surface of the specimen. An ordinary formation of oxide particles was observed between these bands. (2) The diffusion of oxygen through the internally oxidized layer seems to be interrupted by these oxide bands. Therefore, the rate of internal oxidation was decreased by the formation of oxide bands. (3) The formation of oxide bands seems to be attributable to the diffusiblity of solute atom in the matrix to the oxide particles which are simultaneously nucleated at the equal distance from the surface. An oxide band was formed from a bundle of very small rod-shaped oxide crystals parallel to the direction of internal oxidation.
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