Abstract
Large-area surface plasmon polariton interference lithography (LSPPIL) is a promising nano-fabrication technique for making periodic nano-patterns. In this paper, for reducing further the feature size of a lithography pattern, we propose to use 193nm illumination wavelength in LSPPIL and replace the silver coating by tungsten. Theoretical analysis and preliminary numerical simulations indicate that 193nm-LSPPIL can produce periodic patterns with a critical dimension as small as 30nm with high contrast and enough long exposure depth. 193nm interference nanolithography based on SPP has the potential to realize the 32nm node periodic nano-structure manufacture.
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