Abstract
Complex micro- and nano-structure can be formed simply by generating complex electric fields holographically with a spatial light modulator (SLM) by liquid crystal on silicon (LCOS) technology. Processing patterns for micro-patterns to be desired are commonly generated by computer generated hologram (CGH). In this study, to realize the more precise micro-processing with highly flexible pattern by use of the LCOS-SLM, a novel CGH algorithm suitable to micrometer order processing is developed, into which the principle of a phase shift mask is applied. From the results of processing experiments to form micro holes and longitudinal ridges, the novel algorithm can provide more precise processing.
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