Abstract
Moire method was introduced by Weller in 1948 and has been improved by many researchers. The classical Moire method, referred to as geometric or coarse Moire has been widely used in experimental stress and strain analysis. Therefore authors have developed an electron Moire method which can be detected the micro-deformation of the specimen. The model grids for this method were fabricated by an electron beam lithography and photo-lithography. Recently, femtosecond laser exposure has been used for fabricate micro-size devices which size is a few micro-meters. In this study, a model grid for an electron Moire method and a scanning laser Moire method were fabricated by a femtosecond laser exposure systems. These model grids were tried to be used for observation of the micro Moire fringe.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: The Proceedings of the Materials and processing conference
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
