Abstract
The stripping technology of single-wafer processing using the ozone is investigated on photoresist stripping in the semiconductor manufacturing in order to avoid generating residual sulfate group after the stripping. In the present study, we propose the ozone microbubble with a venturi tube. To evaluate on the performance of the photoresist stripping with the ozone microbubbles, first, the generation of ozone microbubbles is observed in the venturi tube via a high-speed video camera. Next, to clarify the effect of the superficial liquid and gas velocities on the ozone water concentration and photoresist stripping rate, the ozone water concentration measurement and photoresist stripping are conducted experimentally. As a result, the ozone water concentration increases and the thickness of remained photoresist reduce with increasing superficial velocity. In addition, compared with the existing study, it is suggested that the superficial liquid and gas velocities, and ozone water concentration, affect the photoresist stripping rate.
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