用于1 m Seya-Namioka单色仪的1 200 lp/mm Laminar光栅

Abstract

To meet the need of 1 m Seya-Namioka monochromator for gratings in the combustion and flame endstation at National Synchrotron Radiation Laboratory(NSRL),1 200 lp /mm Laminar gratings were succesfully fabricated with holographic lithography and ion beam etching.The duty cycle of a resist grating mask was adjusted by resist-ashing,then the resist grating mask was etched in the range of theory design error and its pattern was transfered on a substrate by the scanning ion beam etching method.A gold film with a thickness of 40 nm was coated by ion beam sputtering and an aluminium film with a thickness of 60 nm by evaporating on gratings,respectively,after the rest resist was removed and cleaned.The microstructures of gratings were characterized by an Atomic Force Microscopy(AFM),and results show that the groove depth is 40 nm and duty cycle is 0.45 for the gratings.Synchrotron radiation wavelength scanning were also performed at the exit slit of the combustion and flame endstation,the results indicate that the photon intensity of Al-coated grating is better than that of Au-coated one which agrees well with the calculated results.The Au-coated grating has been used for experimental investigation for 3 years,futhermore its lifetime has been larger than that of the replica grating.