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Abstract
The new technique of ion plating has become such an important method of producing robust, strongly adherent thin films of metals or metallic salts on substrates that there has developed considerable industrial interest in this activity. Amongst such developments, Nanotech (Thin Films) Ltd have played a notable part. The three papers presented here are all by scientists or engineers at that firm and give accounts of some of their recent developments. The topics are Inert gas-handling in ion-plating systems, Radio-frequency plasma excitation and An evaporation source pellet or slug-feeding system.*
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